Afzali-Kushaa, Ali A.: search on Z-Library

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1

Absorption and population inversion in p-type InGaAs strained layers based on intervalence subband transition at FIR frequencies

Xiangkun Zhang, Ali Afzali-Kushaa, Wenliang Chen, Gordon Munns, George I. Haddad

Journal:

Infrared Physics & Technology

Year:

1995

Language:

english

File:

PDF, 350 KB

english, 1995

2

SPIE Proceedings [SPIE Photonics West '95 - San Jose, CA (Wednesday 1 February 1995)] Optoelectronic Integrated Circuit Materials, Physics, and Devices - Lasers based on intersubband transitions in quantum wells

Afzali-Kushaa, Ali A., Haddad, George I., Razeghi, Manijeh, Park, Yoon-Soo, Witt, Gerald L.

Year:

1995

Language:

english

File:

PDF, 1.10 MB

english, 1995

3

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Synthesis and lithographic performance of poly-4-hydroxphenyl-ethyl-methacrylate-based negative resists

Gelorme, Jeffrey D., Kosbar, Laura L., Graham, Teresita O., Afzali-Kushaa, Ali, Houlihan, Francis M.

Year:

2000

Language:

english

File:

PDF, 1.39 MB

english, 2000

4

Intraband Absorption in P-Type InGaAs at FIR Frequencies

Zhang, Xiangkun, Liao, Phengpiao, Afzali-Kushaa, Ali, Haddad, George I.

Journal:

MRS Proceedings

Year:

1993

Language:

english

File:

PDF, 289 KB

english, 1993

5

High frequency characteristics of MESFETs

Ali Afzali-Kushaa, George I. Haddad

Journal:

Solid-State Electronics

Year:

1995

Language:

english

File:

PDF, 438 KB

english, 1995

6

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Improved resolution with advanced negative DUV photoresist with 0.26N capability

Prokopowicz, Gregory P., Georger, Jr., Jacque H., Ayyash, Eyad, Thackeray, James W., Brunsvold, William R., Kosbar, Laura L., Afzali-Kushaa, Ali, Gelorme, Jeffrey D., Conley, Will

Year:

1999

Language:

english

File:

PDF, 3.66 MB

english, 1999

7

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Advanced negative resists using novel aminoplast crosslinkers

Afzali-Kushaa, Ali, Gelorme, Jeffrey D., Kosbar, Laura L., Neisser, Mark O., Brunswold, W., Feild, Christopher, Lawson, Margaret C., Varanasi, Pushkara R.

Year:

1998

Language:

english

File:

PDF, 819 KB

english, 1998

8

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Patterning of highly conducting polyaniline films

Graham, Teresita O., Afzali-Kushaa, Ali, Angelopoulos, Marie, Gelorme, Jeffrey D., Shaw, Jane M., Dobisz, Elizabeth A.

Year:

2000

Language:

english

File:

PDF, 2.88 MB

english, 2000

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